Optics: measuring and testing – By polarized light examination – Of surface reflection
Reexamination Certificate
2009-11-30
2011-10-18
Punnoose, Roy (Department: 2886)
Optics: measuring and testing
By polarized light examination
Of surface reflection
C356S237500
Reexamination Certificate
active
08040512
ABSTRACT:
An illuminating optical system of an inspection device selects an arbitrary wavelength region from the light source, and epi-illuminates the sample via the polarizer and the objective lens. A detecting optical system includes an analyzer having a polarization plane intersected with a polarization direction of the polarizer. Then, the detecting optical system detects light from the sample via the objective lens and the analyzer, and acquires a Fourier image of a sample surface based on this light. An imaging section images the Fourier image. An analyzing section performs computation for processing for determining a notable area to be affected by a state of the pattern more than other areas in the Fourier image.
REFERENCES:
patent: 2004/0150821 (2004-08-01), Shibata et al.
patent: 2006/0072106 (2006-04-01), Matsui et al.
patent: A-2-189448 (1990-07-01), None
patent: A-2000-155099 (2000-06-01), None
patent: A-2003-302354 (2003-10-01), None
patent: A-2005-233869 (2005-09-01), None
patent: WO 2008/015973 (2008-02-01), None
International Preliminary Report on Patentability for International Application No. PCT/JP2008/001481, issued Dec. 17, 2009. (w/ Translation).
International Search Report for International Application No. PCT/JP2008/001481, issued Jul. 8, 2008.
Boye, Carol A., “Industry Survey on Non-visual Defect Detection,” Process and Materials Characterization and Diagnostics in IC Manufacturing,Proceedings of SPIE, vol. 5041, 2003, pp. 173-182.
Kawai et al., Akitoshi, “Novel CD inspection technology leveraging a form birefringence in a Fourier space,” Metrology, Inspection, and Process Control for Microlithography XXII,Proc. of SPIE, vol. 6922, 69221X, 2008, pp. 69221X-1-69221X-8.
Omori et al., Takeo, “Novel inspection technology for half pitch 55 nm and below,” Metrology, Inspection, and Process Control for Microlithography XIX,Proc. of SPIE, vol. 5752, 2005, pp. 174-182.
Kawai et al., Akitoshi, “Novel CD Inspection Technology Leveraging a Form Birefringence in a Fourier space,” 23 slides, 2008.
Nikon Corporation
Oliff & Berridg,e PLC
Punnoose Roy
LandOfFree
Inspection device, inspection method, and program does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Inspection device, inspection method, and program, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inspection device, inspection method, and program will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4254844