Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-01-04
2008-12-16
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S313000, C430S317000, C430S320000, C430S321000
Reexamination Certificate
active
07465530
ABSTRACT:
An inorganic resist material is provided, which is an incomplete oxide of a phase-change material. The oxygen content in the inorganic resist material is lower than the stoichiometric oxygen content of a complete oxide of the phase-change material, and a general formula of the inorganic resist material is A1-xOx, in which A represents the phase-change material, and x is between 5 at. % and 65 at. %. The inorganic resist material can be used to form line patterns or recording pits with size smaller than the exposure light spot by using the laser of conventional lithography process as an exposure source.
REFERENCES:
patent: 6141315 (2000-10-01), Ebina et al.
patent: 6445675 (2002-09-01), Ebina et al.
patent: 7037413 (2006-05-01), Otoba et al.
patent: 7175962 (2007-02-01), Kouchiyama et al.
patent: 2005/0082162 (2005-04-01), Uno et al.
patent: 2007/0036933 (2007-02-01), Endoh et al.
patent: 2008/0037406 (2008-02-01), Yuzurihara et al.
Chang Sheng-Li
Chen Jung-Po
Cheng Chung-Ta
Chiu Kuo-Chi
Hsu Ming-Fang
Industrial Technology Research Institute
J.C. Patents
Walke Amanda C.
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