Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1995-07-19
1997-11-11
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
430324, 430328, 430330, 430396, G03F 720
Patent
active
056862245
ABSTRACT:
A plurality of a thermal ink jet printheads are fabricated from a heater wafer, on which a plurality of arrays of heaters, transducers and addressing logic are located on one surface thereof, by depositing multiple coatings of a positive photoresist over the heater wafer to achieve a desired thickness and then exposing to the photoresist UV (ultra violet) light through a graded mask. The mask controls the depth of developed resist and concurrently forms a variable depth profile for the ink channel structures containing ink flow channels, reservoirs, and heater pits in a single step. A flat glass substrate with ink inlets formed therein is mated to the patterned photoresist to complete the wafer/substrate pair containing the plurality of printheads. The individual printheads are obtained by a subsequent dicing operation. In an alternate embodiment, a negative acting positive photoresist is used.
REFERENCES:
patent: 4698645 (1987-10-01), Inamoto
patent: 5486449 (1996-01-01), Hosono
Duda Kathleen
Xerox Corporation
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