Ink composition for etching resist, method of forming...

Details Ink composition for etching resist, method of forming... Ink composition for etching resist, method of forming...

2005-09-16

2009-11-10

Deo, Duy-Vu N (Department: 1792)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S285100, C430S287100

Reexamination Certificate

active

07615334

ABSTRACT:
Provided are an ink composition for an etching resist, a method of forming an etching resist pattern using the ink composition, and a method of forming a microchannel using the ink composition. The ink composition is suitable for forming a micro pattern due to its poor spreading on the substrate and is suitable for etching-resist for copper of a printed circuit board and deep etching a stainless steel substrate due to its excellent chemical properties that allow it to resist an etching solution.

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