Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-06-07
2005-06-07
Gilliam, Barbara L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S283100, C430S286100, C430S287100, C430S288100
Reexamination Certificate
active
06902863
ABSTRACT:
An infrared-sensitive photosensitive composition comprising:(A) a resin;(B) a novolak resin; and(C) a light-to-heat converting substance,wherein the resin (A) has, as copolymer components, at least: (1) a (meth)acrylic acid or a monomer represented by formula (I) as defined herein; and (2) at least one compound selected from the group consisting of a (meth)acrylic ester, a (meth)acrylamide derivative, and a styrene derivative.
REFERENCES:
patent: 0 287 212 (1988-10-01), None
patent: 0 855 620 (1998-07-01), None
patent: 46-27919 (1971-08-01), None
patent: 56-69192 (1981-06-01), None
patent: 7-285275 (1995-10-01), None
patent: 10-282643 (1998-10-01), None
patent: 2001-324808 (2001-11-01), None
patent: 2002-23358 (2002-01-01), None
European Search Report dated Feb. 23, 2004.
Kawauchi Ikuo
Nakamura Ippei
Serikawa Takeshi
Tsuchiya Mitsumasa
Fuji Photo Film Co. , Ltd.
Gilliam Barbara L.
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