Infrared optical bulk channel field effect transistor for greate

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257462, 257294, 438 57, 438 69, 438 3, H01L 2904, H01L 2978

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058380345

ABSTRACT:
An infrared optical field effect transistor has been developed using a thin film of Lead Titanate (PbTiO.sub.3) deposited on a n/p.sup.+ Si substrate by RF magnetron sputtering. This transistor possesses excellent pyroelectric properties and can, therefore, be operated even at room temperature. The infrared optical field effect transistor has the following features associated with rapid bulk channel structure and higher mobility:

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