Inductor fabricated with dry film resist and cavity and...

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

Reexamination Certificate

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Reexamination Certificate

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07612428

ABSTRACT:
An inductor fabricated with a dry film resist and a cavity and a method of fabricating the inductor. The cavity can be formed in a substrate to minimize a parasitic capacitance generated by structures of upper electrodes, an insulating layer, and a lower electrode and minimize energy loss caused by an eddy current generated through the substrate. Also, a process of forming and planarizing the cavity can be simplified so as to form the cavity to a sufficient depth. As a result, an inductor having a high quality factor and a high self resonant frequency can be fabricated. Also, a scheme for simply forming and planarizing a cavity is contemplated.

REFERENCES:
patent: 5844299 (1998-12-01), Merrill et al.
patent: 6492708 (2002-12-01), Acosta et al.
patent: 2001-0067188 (2001-07-01), None
patent: 2003-0092380 (2003-12-01), None

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