Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2006-07-25
2006-07-25
Vu, David (Department: 2828)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111810, C156S345480
Reexamination Certificate
active
07081711
ABSTRACT:
A novel pulsed, neutralized ion beam source is provided. The source uses pulsed inductive breakdown of neutral gas, and magnetic acceleration and control of the resulting plasma, to form a beam. The beam supplies ions for applications requiring excellent control of ion species, low remittance, high current density, and spatial uniformity.
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Glidden Steven C.
Greenly John B.
Sanders Howard D.
Applied Pulsed Power, Inc.
Brown & Michaels PC
Vu David
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