Inductively excited ion source

Details Inductively excited ion source Inductively excited ion source

1987-07-30

1989-07-18

Coles, Sr., Edward L.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511181, 313230, 31323131, 3133591, H05H 146, H01T 2300, H01F 1518

Patent

active

048496758

ABSTRACT:
The invention relates to an inductively excited ion source with a vessel (1) around which a coil (2) is wound. The vessel (1) consists of a chemically inert material and is used to receive the substance to be ionized. A high-frequency generator (12) is connected by one of its terminals to the coil (2) both ends of which are grounded, while the other terminal (22) is also grounded. The length of the coil (2) which is to be regarded as an electrically long conductor, is .lambda./2, .lambda. being the wavelength of the voltage of the high-frequency generator (12) (FIG. 3).

REFERENCES:
patent: 3084281 (1963-04-01), Mills
"Electron Cyclontron Wave Resonances . . . Static Magnetic Field", Plasma Physics, vol. 16, pp. 835-844, Pergamon Press, 1974.
"The RF-ION Source Rig 10 for Intense Hydrogen Ion Beams", Journal De Physique, Collogue C7, Supp. No. 7, vol. 40, Jul. 1979, C7-477-478.
"Electron Cyclotron Resonances in a Radio Frequency Ion Source", Nuclear Instruments & Methods 16, (1962), 227-232.

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