Electric heating – Metal heating – By arc
Reexamination Certificate
2006-09-27
2009-08-04
Paschall, Mark H (Department: 3742)
Electric heating
Metal heating
By arc
C219S121430, C315S111510, C156S345450, C204S298310
Reexamination Certificate
active
07569791
ABSTRACT:
An electromagnetic radiation source includes a toroidal chamber that contains an ionizable medium. The electromagnetic radiation source also includes a magnetic core that surrounds a portion of the toroidal chamber. The electromagnetic radiation source also includes a pulse power system for providing pulses of energy to the magnetic core for delivering power to a plasma formed in the toroidal chamber to produce electromagnetic radiation that radiates radially through walls of the toroidal chamber.
REFERENCES:
patent: 3500632 (1970-03-01), Anderson
patent: 3757846 (1973-09-01), Herman, Jr.
patent: 3987334 (1976-10-01), Anderson
patent: 4000036 (1976-12-01), Ensley
patent: 4042848 (1977-08-01), Lee
patent: 4180763 (1979-12-01), Anderson
patent: 4974227 (1990-11-01), Saita et al.
patent: 5681434 (1997-10-01), Eastlund
patent: 5821705 (1998-10-01), Caporaso et al.
patent: 5990632 (1999-11-01), Smith
patent: 6150628 (2000-11-01), Smith et al.
patent: 6359969 (2002-03-01), Shmaenok
patent: 6388226 (2002-05-01), Smith et al.
patent: 6421421 (2002-07-01), McGeoch
patent: 6486431 (2002-11-01), Smith et al.
patent: 6541786 (2003-04-01), Partlo et al.
patent: 6552296 (2003-04-01), Smith et al.
patent: 6559408 (2003-05-01), Smith et al.
patent: 6566668 (2003-05-01), Rauch et al.
patent: 6678037 (2004-01-01), Van Elp et al.
patent: 6804327 (2004-10-01), Schriever et al.
patent: 6815633 (2004-11-01), Chen et al.
patent: 6815700 (2004-11-01), Melnychuk et al.
patent: 6826451 (2004-11-01), del Puerto et al.
patent: 6838684 (2005-01-01), Bakker et al.
patent: 6881971 (2005-04-01), Ahmad
patent: 6894298 (2005-05-01), Ahmad et al.
patent: 7166816 (2007-01-01), Chen et al.
patent: 2002/0154279 (2002-10-01), Koster et al.
patent: 2002/0163313 (2002-11-01), Ness et al.
patent: 2002/0167282 (2002-11-01), Kirkpatrick et al.
patent: 2002/0186814 (2002-12-01), McGeoch
patent: 2002/0186815 (2002-12-01), McGeoch
patent: 2003/0006383 (2003-01-01), Melnychuk et al.
patent: 2003/0011322 (2003-01-01), Popov
patent: 2003/0057877 (2003-03-01), Kurachi et al.
patent: 2003/0068012 (2003-04-01), Ahmad et al.
patent: 2003/0222557 (2003-12-01), Kurachi et al.
patent: 2004/0036423 (2004-02-01), Lezcano et al.
patent: 2004/0108473 (2004-06-01), Melnychuk et al.
patent: 2005/0284576 (2005-12-01), America et al.
patent: 0 890 977 (1999-01-01), None
patent: 2022917 (1994-11-01), None
patent: WO 90/13136 (1990-11-01), None
Atwood, EUV Source Candidates for Clean, Collectable 13-14 nm Wavelength Radiation, class illustrations for Chapter 6 of Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications,Course AST210, UC Berkeley, (Jan. 2004).
Kandlikar, “Heat Transfer Characteristics in Partial Boiling, Fully Developed Boiling, and Significant Void Flow Regions of Subcooled Flow Boiling,”Journal of Heat Transfer(Feb. 2, 1998) pp. 1-7.
Kaneda et al., “Plasma parameters in noble-gas narrow-tube and capillary-tube discharge, positive column plasma,”J. Phys. D: Appl. Phys, vol. 23 (1990) pp. 500-503.
Kapteyn, “Compact Coherent EUV Sources”, presented at Workshop for users of the Proposed Argonne Linear Free-electron Laser Facility (ALFF),Argonne National Laboratory, Argonne, IL (Oct. 30-31, 2003).
Lebert et al., “A gas discharged based radiation source for EUV-lithography,”Microelectronic Engineering, vol. 46 (1999) pp. 449-452.
Liberman et al.,Physics of High-Density Z-Pinch Plasmas, Springer-Verlag, New York, (1999) pp. 1-277.
McGeoch, “Progress on the Astron EUV Source,” presented at the International SEMATECH 2001 Next Generation Lithography Workshop (Aug. 29, 2001) pp. 1-9.
Mohanty et al., “A novel fast capillary discharge system emitting intense EUV radiation,”Microelectronic Engineering, vol. 65 (2003) pp. 47-59.
O'Sullivan et al., “Spectroscopy of a 13.5 nm Laser Plasma Source”International SEMATECH EUVL Source Workshop(Oct. 2002) pp. 1-31.
Pouvesle et al., “Discharge-based sources of XUV-X radiations: development and applications,”Plasma Sources Science and Technologyvol. 12 (2003) pp. S43-S50.
Teramoto et al., “High repetition rate MPC generator-driven capillary Z-pinch EUV source,” SPIE 29thAnnual International Symposium on Microlithography, Santa Clara, CA (Feb. 22-27, 2004) pp. 1-23.
Teramoto et al., “Radiation Characteristics of a Capillary Z-Pinch EUV Source,” 2ndInternational EUVL Symposium, Antwerp, Belgium (Sep. 30-Oct. 2, 2003) pp. 1-18.
Wheeler et al., “The high-power constricted plasma discharge col. I. Theoretical analysis,”J. Phys. D: Appl. Phys, vol. 3 (1970) pp. 1374-1380.
Wheeler, “The high-power constricted plasma discharge col. II. Experimental investigation,”J. Phys. D: Appl. Phys, vol. 4 (1971) pp. 400-408.
F. Inasaka et al., “Critical heat flux multiplier of subcooled flow boiling for non-uniform heating conditions in a swirl tube,”Fusion Engineering and Design, vol. 28, 1995, pp. 53-58.
A. Hassanein et al., “Candidate Plasma-Facing Materials for EUV Lithography Source Components,”Emerging Lithographic Technologies VII, Proceedings of the SPIE, vol. 5037, 2003, pp. 358-369.
M. McGeoch et al., “Star Pinch Scalable EUV Source,”Emerging Lithographic Technologies VII, Proceedings of the SPIE, vol. 5037, 2003, pp. 141-146.
Pankert et al., “Integrating Philips' extreme UV source in the alpha-tools”, Proceedings of SPIE, vol. 5751, pp. 260-271 (2005).
Kogan et al., “Methods of Experimental Investigation and Measurement,” Institute of Thermophysics, Novosibirsk, vol. 31, No. 1, Jan./Feb. 1993, pp. 105-110.
Shao et al., “Vacuum Ultraviolet Light Source Using Electrodeless Discharge,” Japanese Journal of Applied Physics, vol. 25, No. 1, Jan. 1986, pp. 64-67.
Cremers et al., “Evaluation of the Continous Optical Discharge for Spectrochemical Analysis,” Spectrochimica Acta, vol. 40B, No. 4, 1985, pp. 665-679.
Franzen, CW Gas Breakdown in Argon Using 10.6-p.m Laser Radiation, App. Phys. Lett., vol. 21, No. 2, Jul. 15, 1972, pp. 62-64.
“Novellus Charts Early Lead in UV-Assisted Thermal Processing Technology for Post-Deposition Treatment of Advanced Films,” San Jose, CA, Novellus Systems, Inc., Nov. 30, 2004.
Teramoto et al., “Xe- and Sn-Fueled Z-Pinch EUV Source Development Aiming at HVM,” 4thEUVL Symposium, San Diego, CA, Nov. 7-9, 2005, pp. 1-19.
Horiike, “Asia Pacific Regional Update,” EUVA/ASET (Japan), 2005 EUVL Symposium, San Diego, CA.
Besen Matthew M.
Petluri Raghuram L. V.
Smith Donald K.
Energetiq Technology Inc.
Paschall Mark H
Proskauer Rose LLP
LandOfFree
Inductively-driven plasma light source does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Inductively-driven plasma light source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inductively-driven plasma light source will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4126674