Inductively coupled source for deriving substantially uniform pl

Details Inductively coupled source for deriving substantially uniform pl Inductively coupled source for deriving substantially uniform pl

1996-06-10

1998-06-02

Tsai, Jey

Coating apparatus

Gas or vapor deposition

With treating means

118723IR, C23C 1600

Patent

active

057592802

ABSTRACT:
A planar coil exciting a plasma of an r.f. vacuum plasma processor for a workpiece processed surface in a chamber includes plural turns. The coil, chamber and workpiece are arranged to produce in the chamber a magnetic flux having substantially greater density in peripheral portions of the coil and chamber than in a center portion of the chamber and coil so a substantially uniform plasma flux is incident on a processed surface of the workpiece.

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