Inductively-coupled plasma source

Details Inductively-coupled plasma source Inductively-coupled plasma source

2011-06-28

2011-06-28

Owens, Douglas W (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111410, C315S111510

Reexamination Certificate

active

07969096

ABSTRACT:
A method and apparatus for exciting gas that involves generating an alternating magnetic field unidirectionally through a magnetic core defining a gap, across the gap and through a plasma vessel that includes dielectric material. The magnetic field induces an electric field in the plasma vessel that generates the plasma.

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