Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1998-03-12
1999-11-09
Shingleton, Michael B
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511151, H01J 724
Patent
active
059821000
ABSTRACT:
A plasma reactor incorporating the invention includes a plasma chamber and one or more gas inlets for introducing an ionizable gas into the plasma chamber. A dielectric plate is positioned over an opening to the plasma chamber and above a support that holds a workpiece. An inductor is juxtapositioned to the dielectric plate and comprises multiple winding portions which evidence plural segments of increasing radii from a center of the inductor. Segments of lesser radii are arranged to reside further away from the dielectric plate than segments of greater radii, lending the inductor a truncated conical shape with respect to the dielectric plate. By modifying the pitch angle and/or radius of the plural segments, the field configuration within the chamber can be varied to accommodate different workpieces. Further, a conductive support is positioned between the dielectric plate and the plasma chamber and serves as a support for the dielectric plate, an electrostatic shield between the dielectric plate and the plasma chamber, and further provides channels for the introduction of one or more ionizable gases into the chamber.
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Pars, Inc.
Shingleton Michael B
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