Inductively coupled planar source for substantially uniform plas

Details Inductively coupled planar source for substantially uniform plas Inductively coupled planar source for substantially uniform plas

1997-11-28

2000-02-22

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723I, H05H 100

Patent

active

060276037

ABSTRACT:
A planar coil exciting a plasma of an r.f. vacuum plasma processor for a workpiece processed surface in a chamber includes plural turns. The coil, chamber and workpiece are arranged to produce in the chamber a magnetic flux having substantially greater density in peripheral portions of the coil and chamber than in a center portion of the chamber and coil so a substantially uniform plasma flux is incident on a processed surface of the workpiece.

REFERENCES:
patent: 4340482 (1982-07-01), Sternberg
patent: 4612077 (1986-09-01), Tracy et al.
patent: 4615755 (1986-10-01), Tracy et al.
patent: 4617079 (1986-10-01), Tracy et al.
patent: 4948458 (1990-08-01), Ogle
patent: 5198718 (1993-03-01), Davis et al.
patent: 5234529 (1993-08-01), Johnson
patent: 5241245 (1993-08-01), Barnes et al.
patent: 5261962 (1993-11-01), Hamamoto et al.
patent: 5304279 (1994-04-01), Coultas et al.
patent: 5368710 (1994-11-01), Chen et al.
patent: 5401350 (1995-03-01), Patrick et al.
patent: 5405480 (1995-04-01), Benzing et al.
patent: 5433812 (1995-07-01), Cuomo et al.
patent: 5525159 (1996-06-01), Hama et al.
patent: 5529657 (1996-06-01), Ishii
patent: 5540824 (1996-07-01), Yin et al.
patent: 5558722 (1996-09-01), Okumura et al.
patent: 5795429 (1998-08-01), Ishii et al.

Affiliated with

Also associated with

Rating

Inductively coupled planar source for substantially uniform plas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inductively coupled planar source for substantially uniform plas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inductively coupled planar source for substantially uniform plas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-517385