Inductively-coupled high density plasma producing apparatus and

Details Inductively-coupled high density plasma producing apparatus and Inductively-coupled high density plasma producing apparatus and

1999-03-11

2000-11-21

Shingleton, Michael B

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511121, 118723AN, 118723I, H01J 724

Patent

active

061507636

ABSTRACT:
This invention relates to an inductively-coupled high density plasma producing apparatus and a plasma processing equipment having the apparatus. The plasma processing equipment consists of a shape-adjustable coil (antenna), a RF power generator, an impedance matching network, a plasma chamber, a gas supply system, and a vacuum system. The gases for producing plasma are fed into the plasma chamber. The RF power is fed into the coil to produce plasma in the plasma chamber. This invention is characterized by the provision of a shape-adjustable coil, which is used to shape the RF power profile in the plasma chamber such that the plasma density profile (uniformity) can be controlled.

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