Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2006-08-29
2006-08-29
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C156S345480
Reexamination Certificate
active
07096819
ABSTRACT:
An inductive plasma processor includes a multiple winding radio frequency coil having plural electrically parallel, spatially concentric windings (1) having different amounts of RF power supplied to them, and (2) arranged to produce electromagnetic fields having different couplings to different regions of plasma in the chamber to control plasma flux distribution incident on a processed workpiece. The coil is powered by a single radio frequency generator via a single matching network. Input and output ends of each winding are respectively connected to input and output tuning capacitors. In a first embodiment, the location of maximum inductive coupling of the radio frequency to the plasma and the current magnitude in each winding are respectively mainly determined by values of the output and input capacitors. By adjusting all the input and output capacitors simultaneously, the current to a winding can be varied while the current to the other winding can be maintained constant as if these windings were completely de-coupled and independent. Therefore, the capacitors can control the plasma density in different radial and azimuthal regions. In another embodiment, a relatively low frequency drives the coil whereby each winding has a relatively short electrical length, causing substantially small standing wave current and voltage variations. The output capacitor for each winding adjusts current magnitude, to eliminate the need for the input capacitors and reduce operational complexity.
REFERENCES:
patent: 4948458 (1990-08-01), Ogle
patent: 5226967 (1993-07-01), Chen et al.
patent: 5277752 (1994-01-01), Aydil et al.
patent: 5304279 (1994-04-01), Coultas et al.
patent: 5368710 (1994-11-01), Chen et al.
patent: 5401350 (1995-03-01), Patrick et al.
patent: 5558722 (1996-09-01), Okumura et al.
patent: 5571366 (1996-11-01), Ishii et al.
patent: 5589737 (1996-12-01), Barnes et al.
patent: 5688357 (1997-11-01), Hanawa
patent: 5731565 (1998-03-01), Gates
patent: 5759280 (1998-06-01), Holland et al.
patent: 5795429 (1998-08-01), Ishii et al.
patent: 5800619 (1998-09-01), Holland et al.
patent: 5865937 (1999-02-01), Shan et al.
patent: 5874704 (1999-02-01), Gates
patent: 5897713 (1999-04-01), Tomioka et al.
patent: 5907221 (1999-05-01), Sato et al.
patent: 5935373 (1999-08-01), Koshimizu
patent: 6028395 (2000-02-01), Holland et al.
patent: 6051073 (2000-04-01), Chu et al.
patent: 6080271 (2000-06-01), Fujii
patent: 6095159 (2000-08-01), Blalock et al.
patent: 6136139 (2000-10-01), Ishii et al.
patent: 6164241 (2000-12-01), Chen et al.
patent: 6165311 (2000-12-01), Collins et al.
patent: 6174450 (2001-01-01), Patrick et al.
patent: 6238512 (2001-05-01), Li et al.
patent: 6252354 (2001-06-01), Collins et al.
patent: 6288493 (2001-09-01), Lee et al.
patent: 6319355 (2001-11-01), Holland
patent: 6414648 (2002-07-01), Holland et al.
patent: 6579426 (2003-06-01), van Gogh et al.
patent: 0838843 (1998-04-01), None
patent: 1 130 948 (2001-09-01), None
patent: 40805998 (1996-02-01), None
patent: 11144894 (1999-05-01), None
patent: WO 00/00993 (2000-01-01), None
patent: WO 01/19144 (2001-03-01), None
Chen Jian J.
Veltrop Robert G.
Wicker Thomas E.
Crowell Michelle
Hassanzadeh Parviz
Lam Research Corporation
LandOfFree
Inductive plasma processor having coil with plural windings... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Inductive plasma processor having coil with plural windings..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inductive plasma processor having coil with plural windings... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3703270