Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2011-08-09
2011-08-09
Owens, Douglas W (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111410, C315S111510, C156S345420
Reexamination Certificate
active
07994724
ABSTRACT:
An inductive plasma applicator comprises a ferromagnetic inductively coupled source and an electrode with a hole pattern centered with respect to the plasma source. Such plasma applicator provides an efficient energy transfer to the plasma. The plasma applicator is preferably manufactured using a technology for producing electrical circuits. The electrode and a coil of the ferromagnetic inductively coupled plasma source are metal track portions formed on an insulating substrate. For example, the plasma applicator is manufactured using printed circuit board technology.
REFERENCES:
patent: 4745337 (1988-05-01), Pichot et al.
patent: 5304279 (1994-04-01), Coultas et al.
patent: 5435881 (1995-07-01), Ogle
patent: 5683548 (1997-11-01), Hartig et al.
patent: 5795429 (1998-08-01), Ishii et al.
patent: 5944942 (1999-08-01), Ogle
patent: 6020686 (2000-02-01), Ye et al.
patent: 6068784 (2000-05-01), Collins et al.
patent: 6080271 (2000-06-01), Fujii
patent: 6158384 (2000-12-01), Ye et al.
patent: 6204607 (2001-03-01), Elingboe
patent: 6252354 (2001-06-01), Collins et al.
patent: 6273022 (2001-08-01), Pu et al.
patent: 6321681 (2001-11-01), Colpo et al.
patent: 6348126 (2002-02-01), Hanawa et al.
patent: 6388382 (2002-05-01), Doi et al.
patent: 6422173 (2002-07-01), Nakajima
patent: 6551447 (2003-04-01), Savas et al.
patent: 6755150 (2004-06-01), Lai et al.
patent: 6850012 (2005-02-01), Edamura et al.
patent: 7255774 (2007-08-01), Vukovic et al.
patent: 2008/0050292 (2008-02-01), Godyak
patent: 2008/0050537 (2008-02-01), Godyak
patent: 2008/0088242 (2008-04-01), Shun'ko
patent: 2008/0124254 (2008-05-01), Choi
patent: WO 2006/056573 (2006-06-01), None
Centre National de la Recherche Scientifique--CNRS
Ecole Polytechnique
Le Tung X
Miller Matthias & Hull LLP
Owens Douglas W
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