Inductive coil for inductively coupled plasma production apparat

Details Inductive coil for inductively coupled plasma production apparat Inductive coil for inductively coupled plasma production apparat

1993-03-04

1994-05-03

Pascal, Robert J.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511141, 31511121, 315267, 315344, 21912151, 118723R, H01J 724

Patent

active

053090632

ABSTRACT:
The invention is directed to an induction coil which includes a flat spirally wound portion and a tubular spirally wound portion extending from the outer edge of the flat portion. The axis of the tubular portion is substantially perpendicular to the flat portion. The coil is useful in a plasma production apparatus which includes a chamber having walls and adapted to be evacuated. A window extends into the chamber from one of the walls. The coil is in the window with the flat portion being at the bottom of the window.

REFERENCES:
patent: 2015885 (1935-10-01), Dallenbach
patent: 3384773 (1968-03-01), Kauer
patent: 3546522 (1970-12-01), Thorpe
patent: 4206387 (1980-06-01), Kramer et al.
patent: 4836140 (1989-06-01), Koji
patent: 4844775 (1989-07-01), Keeble
patent: 4894589 (1990-01-01), Borowiec
patent: 4948458 (1990-08-01), Ogle
patent: 4982140 (1991-01-01), Witting
patent: 5007373 (1991-04-01), Legg et al.
patent: 5047693 (1991-09-01), Roberts
patent: 5140227 (1992-08-01), Dakin et al.
patent: 5162699 (1992-11-01), Tokoro et al.

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