Induction heated reactor system for chemical vapor deposition

Details Induction heated reactor system for chemical vapor deposition Induction heated reactor system for chemical vapor deposition

1985-02-06

1986-04-01

Lusignan, Michael R.

Coating apparatus

Work holders, or handling devices

118724, 118725, 118729, 118730, 219 1049R, 219 1067, 219 1075, C23C 1600, H05B 500, H05B 664

Patent

active

045790809

ABSTRACT:
A chemical vapor deposition system which includes a generally closed reaction chamber having walls formed from a dielectric material. A susceptor for carrying a plurality of semiconductor wafers is positioned within the chamber. An induction coil is positioned in the vicinity of the susceptor for carrying an alternating electric current to produce induction heating of the susceptor and thereby heating the back side of the wafers thereon. Low frequency induction heating and variations in susceptor thickness are used to produce uniformity of temperature. Boundary control arrangement between the susceptor surface and wafer surfaces are used to improve deposition uniformity. A coating is formed on wall portions of the reaction chamber facing the susceptor and wafers carried thereon for reflecting heat energy radiated from the susceptor and the wafers positioned thereon back to the susceptor and the wafers to reduce substantially the heat loss therefrom and thereby to reduce substantially the thermal gradient from front to back surfaces of the wafers.

REFERENCES:
patent: 3665139 (1972-05-01), Steggewentz
patent: 4258658 (1981-03-01), Politycki et al.
patent: 4284867 (1981-08-01), Hill et al.

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