Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-08-02
1996-04-30
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20419226, 427108, 427167, 427344, C23C 1434
Patent
active
055121489
ABSTRACT:
A substrate is treated prior to use to induce a near-parallel orientation of a liquid crystal director relative to the substrate. A layer of silica is deposited on the substrate by in-line magnetron sputtering as the substrate is moved past the sputtering target, and the silica-coated substrate is thereafter treated with an alcohol that is selected from one of two classes of alcohols: (1) alcohols having an aromatic ring structure on one end of an aliphatic chain and a hydroxy group on the other end, with or without at least one ether group in the chain, and (2) an aliphatic chain having a hydroxy group at one end and at least one ether linkage in the chain. An example is 2-phenylethanol. The alcohol-treated substrate is covered with a layer of the liquid crystal. The process of the invention induces a tilt to the director of the liquid crystal. The tilt is about 0.5.degree. to 4.degree., as measured parallel to the surface of the substrate.
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Miller Leroy J.
Smith, Jr. Willis H.
Denson-Low W. K.
Duraiswamy V. D.
Hughes Aircraft Company
Nguyen Nam
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