Individually controllable radiation sources for providing an ima

Details Individually controllable radiation sources for providing an ima Individually controllable radiation sources for providing an ima

1996-12-04

1998-11-24

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430322, 430325, 430326, 430945, 430967, G03F 900

Patent

active

058404511

ABSTRACT:
A photolithographic system includes individually controllable radiation sources for forming an image pattern on an image plane without using a reticle or mask during fabrication of an integrated circuit device. The radiation sources are selectively activated as they scan the image plane. The image pattern can consist of parallel lines having identical widths and varying lengths, or alternatively, pixels having identical shapes and sizes. The radiation sources can be arranged as a linear array, or a staggered array, to achieve the desired linear density. Suitable radiation sources include light pipes, light emitting diodes, and laser diodes. Preferably, each of the activated radiation sources provides an exposure field of less than 0.1 microns on the image plane, and at least two of the radiation sources must be activated to provide the minimum line width of the image pattern.

REFERENCES:
patent: 5193008 (1993-03-01), Frazier et al.
patent: 5300956 (1994-04-01), Ohta et al.
patent: 5389959 (1995-02-01), Haas
patent: 5636004 (1997-06-01), Ootaka et al.
patent: 5728495 (1998-03-01), Ozawa

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