Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-02-01
2005-02-01
Versteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192220, C204S192260
Reexamination Certificate
active
06849165
ABSTRACT:
A process for the deposition of transparent and conductive indium-tin oxide (ITO) films with a particularly low resistance of preferably less than 200 μΩcm and a small surface roughness of preferably less than 1 nm on a substrate, wherein combined HF/DC sputtering of an indium-tin oxide (ITO) target is employed and wherein the process gas is supplemented by an argon/hydrogen mixture as reaction gas during the sputtering, as well as ITO-films with the above-named characteristics.
REFERENCES:
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patent: 05239635 (1993-09-01), None
patent: 09293693 (1997-11-01), None
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Klöppel Andreas
Trube Jutta
Sheridan Ross PC
Unaxis Deutschland GmbH
Versteeg Steven
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