Independent radiant gas preheating for precursor...

Details Independent radiant gas preheating for precursor... Independent radiant gas preheating for precursor...

2011-07-12

2011-07-12

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345100

Reexamination Certificate

active

07976634

ABSTRACT:
A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.

REFERENCES:
patent: 4913929 (1990-04-01), Moslehi et al.
patent: 5108792 (1992-04-01), Anderson et al.
patent: 5149375 (1992-09-01), Matsuyama
patent: 5155336 (1992-10-01), Gronet et al.
patent: 5179677 (1993-01-01), Anderson et al.
patent: 5310260 (1994-05-01), Schietinger et al.
patent: 5482739 (1996-01-01), Hey et al.
patent: 5892886 (1999-04-01), Sandhu
patent: 5916369 (1999-06-01), Anderson et al.
patent: 6037273 (2000-03-01), Gronet et al.
patent: 6159866 (2000-12-01), Gronet et al.
patent: 6342421 (2002-01-01), Mitani et al.
patent: 6482739 (2002-11-01), Wu et al.
patent: 6527865 (2003-03-01), Sajoto et al.
patent: 6614181 (2003-09-01), Harvey et al.
patent: 6703321 (2004-03-01), Geiger et al.
patent: 6900133 (2005-05-01), Chinn et al.
patent: 6951827 (2005-10-01), Utz et al.
patent: 6972228 (2005-12-01), Doyle et al.
patent: 2003/0037879 (2003-02-01), Askarinam et al.
patent: 2003/0134136 (2003-07-01), Biscotto et al.
patent: 2004/0198153 (2004-10-01), Halpin et al.
patent: 2004/0200417 (2004-10-01), Hanawa et al.
patent: 2004/0216514 (2004-11-01), Nunnally et al.
patent: 2005/0079735 (2005-04-01), Higuchi et al.
patent: 2005/0271814 (2005-12-01), Chang et al.
patent: 2005/0277272 (2005-12-01), Singh et al.
patent: 2006/0021574 (2006-02-01), Armour et al.
patent: 2006/0078676 (2006-04-01), Lukas et al.
patent: 2006/0234504 (2006-10-01), Bauer et al.
patent: 2007/0170148 (2007-07-01), Kuppurao et al.
International Search Report and Written Opinion of the International Searching Authority mailed Jun. 5, 2008 (PCT/US07/84482; 011249PCT).
Zhiheng Liu, et al.; Desorption of H from Si(111) by Resonant Excitation of the Si-H Vibrational Stretch Mode; Science (May 19, 2006), pp. 1024-1026, vol. 312.
V. A. Levin, et al.; The initiation of a detonation process in H2-C12 Mixture; Arch. Thermodyn. Spal. (1978) 9(4):613-622.
Knox, Ferro; The H2+C12 Explosion as a Chemical Analogue of the Photoelectric Effect: A True Quantum Mechanical Demonstration; Journal of Chemical Education (1990) 67(10):897.
J. H. Lee, et al.; Photochemical Initiation of Gaseous Detonations; Acta Astronautica (1978) 5:971-982.
Niki, et al.; An FTIR Study of the Kinetics and Mechanism for the Cl- and Br-Atom-Initiated Oxidation of SiH4; J. Phys. Chem. (1985) 89:1752-1755.

Affiliated with

Also associated with

Rating

Independent radiant gas preheating for precursor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Independent radiant gas preheating for precursor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Independent radiant gas preheating for precursor... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2707329