Increasing the sensitivity of an in-situ particle monitor

Details Increasing the sensitivity of an in-situ particle monitor Increasing the sensitivity of an in-situ particle monitor

1998-01-30

2000-10-03

Beck, Shrive

Coating apparatus

Gas or vapor deposition

With treating means

118723FI, 156345, C23C 1600, H05H 100

Patent

active

061257893

ABSTRACT:
A method and apparatus for increasing the sensitivity of an in situ particle monitor. A light scattering technique, preferably using laser light, is employed to monitor particle concentrations within the processing chamber of a plasma-based substrate processing system. Particle concentrations are increased in the light field of the sensor by creating an electric or magnetic field in the processing chamber to concentrate the particles suspended therein.

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