Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1988-02-12
1990-07-10
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430281, 430275, 430278, 430916, 430920, 522 24, 522 26, 502 5, 502160, G03C 170, G03C 178, G03C 194, B01J 3734
Patent
active
049406485
ABSTRACT:
A photo polymerization initiator composition is disclosed. The composition is comprised of an organic peroxide or perester in admixture with 9-phenyl acridine, or phenazine initiator compound. The initiator composition is useful in preparing photopolymerizable compositions having increased effective photospeed.
REFERENCES:
patent: 2948611 (1960-08-01), Barney
patent: 3047422 (1962-07-01), Sites et al.
patent: 3729313 (1973-04-01), Smith
patent: 3765898 (1973-10-01), Bauer et al.
patent: 3954475 (1976-05-01), Bonham et al.
patent: 4046577 (1977-09-01), Muzycko et al.
patent: 4239850 (1980-12-01), Kita et al.
patent: 4258123 (1981-03-01), Nagashima et al.
patent: 4416975 (1983-11-01), Green et al.
patent: 4481276 (1984-11-01), Ishikawa et al.
patent: 4498963 (1985-02-01), Neckers
patent: 4505793 (1985-03-01), Tamoto et al.
patent: 4587200 (1986-05-01), Tamoto et al.
patent: 4684670 (1987-08-01), Eckberg et al.
patent: 4746685 (1988-05-01), Masuhara et al.
patent: 4772538 (1988-09-01), Walls et al.
patent: 4845011 (1989-09-01), Wilczak
Hamilton Cynthia
Hoechst Celanese Corporation
Michl Paul R.
Roberts Richard S.
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