Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2005-09-27
2005-09-27
Hassanzadet, P. (Department: 1763)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C216S094000, C216S065000, C156S345500, C156S345390, C156S345240, C156S345100, C219S121780, C219S121680, C219S121790, C219S121140
Reexamination Certificate
active
06949147
ABSTRACT:
Apparatus and a method for removing particles from the surface of a substrate include determining respective position coordinates of the particles on the surface. A beam of electromagnetic energy is directed via an optical cleaning arm at the coordinates of each of the particles in turn, such that absorption of the electromagnetic energy at the surface causes the particles to be dislodged from the surface substantially without damage to the surface itself.
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patent: 5531857 (1996-07-01), Engelsberg et al.
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Butterbaugh, “Surface Contamination Control Using Integrated Cleaning”, Semiconductor International, Jun. 1998, pp. 1-5.
Poles Ehud
Uziel Yoram
Wachs Amir
Yogev David
Hassanzadet P.
Kackar Ram N
Olson & Hierl Ltd.
Oramir Semiconductor Equipment Ltd.
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