Optics: measuring and testing – By polarized light examination – Of surface reflection
Reexamination Certificate
2002-12-23
2008-08-19
Schillinger, Laura M (Department: 2813)
Optics: measuring and testing
By polarized light examination
Of surface reflection
C356S630000, C438S016000
Reexamination Certificate
active
07414721
ABSTRACT:
An in-line, in-process or in-situ and non-destructive metrology system, apparatus and method provides composition, quality and/or thickness measurement of a thin film or multi-layer thin film formed on a substrate in a thin film processing system. Particularly, the subject invention provides a spectroscopic ellipsometer performing spectroscopic ellipsometry while the wafer is in a thin film processing system. In one form, the spectroscopic ellipsometer is associated with a wet bench system portion of the thin film processing system. The spectroscopic ellipsometer obtains characteristic data regarding the formed thin film to calculate penetration depth (Dp) for a thin film formed on the substrate. Particularly, the ellipsometer obtains an extinction coefficient (k) which is used to calculate penetration depth (Dp). Penetration depth (Dp), being a unique function of the extinction coefficient (k) provides the information for the composition, quality and/or thickness monitoring of the thin film.
REFERENCES:
patent: 5361967 (1994-11-01), Anderson et al.
patent: 5877859 (1999-03-01), Aspnes et al.
patent: 6080531 (2000-06-01), Carter et al.
patent: 6168961 (2001-01-01), Vaccari
patent: 6181421 (2001-01-01), Aspnes et al.
patent: 6268917 (2001-07-01), Johs
patent: 6275291 (2001-08-01), Abraham et al.
patent: 6320657 (2001-11-01), Aspnes et al.
patent: 6342450 (2002-01-01), Lattard
patent: 6383724 (2002-05-01), Carter et al.
patent: 6408048 (2002-06-01), Opsal et al.
patent: 6449043 (2002-09-01), Aspnes et al.
patent: 6462817 (2002-10-01), Strocchia-Rivera
patent: 6465265 (2002-10-01), Opsal et al.
patent: 6673637 (2004-01-01), Wack et al.
patent: 6694284 (2004-02-01), Nikoonahad et al.
patent: 7235495 (2007-06-01), Wagener
patent: 2002/0045282 (2002-04-01), Opsal et al.
patent: 2005/0048800 (2005-03-01), Wagener
patent: 2007/0218668 (2007-09-01), Wagener
Le Ynhi Thi
Suvkhanov Agajan
LSI Corporation
Maginot Moore & Beck
Schillinger Laura M
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