In situ method and apparatus for detecting surface defects to id

Error detection/correction and fault detection/recovery – Data processing system error or fault handling – Reliability and availability

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

714 48, H05K 1000

Patent

active

061548588

ABSTRACT:
A method and apparatus are provided for detecting handling damage in a direct access storage device (DASD). The DASD has at least two magnetic disk surfaces provided by at least one disk mounted for rotation, and a corresponding transducer mounted for movement across each disk surfaces. A predefined test is performed to identify magnetic surface defects on each of the disk surfaces. The identified magnetic surface defects are utilized to identify cosited defects on at least two magnetic disk surfaces. Responsive to identifying a predefined number of cosited defects on at least two magnetic disk surfaces, handling damage is reported to the user. The method for detecting handling damage is performed responsive to a user request and following predetermined events during use of the direct access storage device.

REFERENCES:
patent: 3771143 (1973-11-01), Taylor
patent: 5422890 (1995-06-01), Klingsporn et al.
patent: 5633767 (1997-05-01), Boutaghou et al.
patent: 5661615 (1997-08-01), Waugh et al.
patent: 5666237 (1997-09-01), Lewis
patent: 5727144 (1998-03-01), Brady et al.
patent: 5751947 (1998-05-01), Arakawa
patent: 5828583 (1998-10-01), Bush et al.
patent: 5935261 (1999-08-01), Blachek et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

In situ method and apparatus for detecting surface defects to id does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with In situ method and apparatus for detecting surface defects to id, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and In situ method and apparatus for detecting surface defects to id will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1736122

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.