In-situ local heating using megasonic transducer resonator

Details In-situ local heating using megasonic transducer resonator In-situ local heating using megasonic transducer resonator

2005-01-25

2005-01-25

Markoff, Alexander (Department: 1746)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S001000, C134S184000, C134S902000, C134S033000, C134S019000, C134S157000

Reexamination Certificate

active

06845778

ABSTRACT:
An apparatus for cleaning a semiconductor substrate is provided. In embodiment of the present invention, a megasonic cleaner capable of providing localized heating is provided. The megasonic cleaner includes a transducer and a resonator. The resonator is configured to propagate energy from the transducer. The resonator has a first and a second end, the first end is operatively coupled to the transducer and the second end is configured to provide localized heating while propagating the energy from the transducer. A system for cleaning a semiconductor substrate through megasonic cleaning and a method for cleaning a semiconductor substrate is also provided.

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