Coating processes – Measuring – testing – or indicating
Patent
1997-03-17
1999-10-19
Bueker, Richard
Coating processes
Measuring, testing, or indicating
4272481, 118696, 118708, 118712, 118715, 118726, C23C 1600
Patent
active
059685883
ABSTRACT:
An apparatus for in-situ control of the flow of a liquid precursor into a deposition chamber comprises a liquid injection system having a liquid injection outlet connected to a chamber inlet line upstream of the deposition chamber. The liquid injection system includes a liquid precursor supply, a carrier gas supply, a vaporizer, and a controller managing flows of the liquid precursor and carrier gas to the chamber. A bypass line is connected to the chamber inlet line and includes a bypass valve, a sonic orifice, and a pressure gauge upstream of the sonic orifice. To calibrate the flow of the liquid precursor, a flow of carrier gas is directed into the bypass line at a carrier gas sonic flow rate. A first steady state pressure is measured with the pressure gauge. The liquid precursor is vaporized and directed to the flow of carrier gas into the bypass line. A second steady state pressure is measured with the pressure gauge. Calibration information is computed using the first steady state pressure and second steady state pressure based on sonic flow theory. The calibration information is used to calibrate the controller to correct deviations in the liquid flow rate and achieve a target liquid precursor flow rate for improving wafer uniformity.
REFERENCES:
patent: 5419924 (1995-05-01), Nagashima et al.
patent: 5520969 (1996-05-01), Nishizato et al.
Chang Fong
Pham Thanh
Plante Jeff
Sivaramakrishnan Visweswaren
Wang Yen-Kun
Applied Materials Inc.
Bueker Richard
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