Imprint lithography

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive...

Reexamination Certificate

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C216S027000, C216S057000

Reexamination Certificate

active

07998651

ABSTRACT:
A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.

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Notice of Reasons for Rejection for Japanese Patent Application No. 2007-123276 dated May 6, 2010.

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