Imprint lithography

Details Imprint lithography Imprint lithography

2008-04-08

2008-04-08

Walke, Amanda (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S270100, C430S322000, C264S496000

Reexamination Certificate

active

07354698

ABSTRACT:
An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.

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Stephen Y. Chou, et al., “Nanoimprint Lithography”, J. Vac. Sci. Technol. B 14(6), Nov./Dec. 1996, pp. 4129-4133.

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