Imprint lithography

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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Details

C430S270100, C430S322000, C264S496000

Reexamination Certificate

active

07354698

ABSTRACT:
An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.

REFERENCES:
patent: 5091339 (1992-02-01), Carey
patent: 5512131 (1996-04-01), Kumar et al.
patent: 5772905 (1998-06-01), Chou
patent: 6165911 (2000-12-01), Calveley
patent: 6309580 (2001-10-01), Chou
patent: 6334960 (2002-01-01), Willson et al.
patent: 6365059 (2002-04-01), Pechenik
patent: 6375870 (2002-04-01), Visovsky et al.
patent: 6482742 (2002-11-01), Chou
patent: 6518189 (2003-02-01), Chou
patent: 6656341 (2003-12-01), Petersson et al.
patent: 6696220 (2004-02-01), Bailey et al.
patent: 6719915 (2004-04-01), Willson et al.
patent: 6921615 (2005-07-01), Sreenivasan et al.
patent: 2002/0093122 (2002-07-01), Choi et al.
patent: 2002/0094496 (2002-07-01), Choi et al.
patent: 2002/0132482 (2002-09-01), Chou
patent: 2002/0167117 (2002-11-01), Chou
patent: 2002/0177319 (2002-11-01), Chou
patent: 2003/0034329 (2003-02-01), Chou
patent: 2003/0080471 (2003-05-01), Chou
patent: 2003/0080472 (2003-05-01), Chou
patent: 2003/0081193 (2003-05-01), White et al.
patent: 2003/0127580 (2003-07-01), Ling et al.
patent: 2003/0139042 (2003-07-01), Heidari
patent: 2003/0141291 (2003-07-01), Heidari et al.
patent: 2003/0159608 (2003-08-01), Heidari
patent: 2003/0170053 (2003-09-01), Montelius et al.
patent: 2003/0189273 (2003-10-01), Olsson
patent: 2004/0005444 (2004-01-01), Heidari
patent: 2004/0009673 (2004-01-01), Sreenivasan et al.
patent: 2004/0021866 (2004-02-01), Watts et al.
patent: 2004/0022888 (2004-02-01), Sreenivasan et al.
patent: 2004/0036201 (2004-02-01), Chou et al.
patent: 2004/0046288 (2004-03-01), Chou
patent: 2004/0081798 (2004-04-01), Lee et al.
patent: 2004/0124566 (2004-07-01), Sreenivasan et al.
patent: 2004/0126547 (2004-07-01), Coomer
patent: 2004/0149367 (2004-08-01), Olsson et al.
patent: 2004/0169003 (2004-09-01), Lee et al.
patent: 2004/0192041 (2004-09-01), Jeong et al.
patent: 2004/0200411 (2004-10-01), Willson et al.
patent: 2004/0209470 (2004-10-01), Bajorek
patent: 2004/0219249 (2004-11-01), Chung et al.
patent: 2004/0219461 (2004-11-01), Chung et al.
patent: 2005/0039618 (2005-02-01), Heidari et al.
patent: 2005/0064054 (2005-03-01), Kasumi
patent: WO 01/79591 (2001-10-01), None
patent: WO 01/79592 (2001-10-01), None
Stephen Y. Chou, et al., “Nanoimprint Lithography”, J. Vac. Sci. Technol. B 14(6), Nov./Dec. 1996, pp. 4129-4133.

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