Plastic article or earthenware shaping or treating: apparatus – Preform reshaping or resizing means: or vulcanizing means... – Surface deformation means only
Reexamination Certificate
2009-05-19
2011-10-25
Ewald, Maria Veronica (Department: 1744)
Plastic article or earthenware shaping or treating: apparatus
Preform reshaping or resizing means: or vulcanizing means...
Surface deformation means only
C425S150000
Reexamination Certificate
active
08043085
ABSTRACT:
An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the imprint template. The first actuator is configured to apply a force to the imprint template. The imprint lithography apparatus further includes a second support structure and a second actuator located between the second support structure and the first support structure. The second actuator is configured to apply a force to the second support structure, wherein a range of movement of the second actuator is greater than a range of movement of the first actuator.
REFERENCES:
patent: 4731155 (1988-03-01), Napoli et al.
patent: 5772905 (1998-06-01), Chou
patent: 6180239 (2001-01-01), Whitesides et al.
patent: 6334960 (2002-01-01), Willson et al.
patent: 2003/0081193 (2003-05-01), White et al.
patent: 2004/0124566 (2004-07-01), Sreenivasan et al.
patent: 2005/0006343 (2005-01-01), Choi et al.
patent: 2005/0274693 (2005-12-01), Heidari et al.
patent: 2006/0279022 (2006-12-01), Seki et al.
patent: 2008/0145774 (2008-06-01), Kruijt-Stegeman et al.
patent: 02/067055 (2002-08-01), None
patent: 2007/132320 (2007-11-01), None
Haisma et al., “Mold-assisted nanolithography: A process for reliable pattern replication”, J. Vac. Sci. Technol. B14 (6), pp. 4124-4128, Nov. 1996.
De Schiffart Catharinus
Jansen Norbert Erwin Therenzo
Jeunink Andre Bernardus
Kruijt-Stegeman Yvonne Wendela
Lafarre Raymond Wilhelmus Louis
ASML Netherlands B.V.
Ewald Maria Veronica
Pillsbury Winthrop Shaw & Pittman LLP
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