Imprint lithography

Plastic article or earthenware shaping or treating: apparatus – Preform reshaping or resizing means: or vulcanizing means... – Surface deformation means only

Reexamination Certificate

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Details

C425S150000

Reexamination Certificate

active

08043085

ABSTRACT:
An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the imprint template. The first actuator is configured to apply a force to the imprint template. The imprint lithography apparatus further includes a second support structure and a second actuator located between the second support structure and the first support structure. The second actuator is configured to apply a force to the second support structure, wherein a range of movement of the second actuator is greater than a range of movement of the first actuator.

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patent: 2007/132320 (2007-11-01), None
Haisma et al., “Mold-assisted nanolithography: A process for reliable pattern replication”, J. Vac. Sci. Technol. B14 (6), pp. 4124-4128, Nov. 1996.

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