Imprint apparatus having attitude control

Plastic article or earthenware shaping or treating: apparatus – Control means responsive to or actuated by means sensing or... – Mold motion or position control

Reexamination Certificate

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C425S375000, C425S429000

Reexamination Certificate

active

07985061

ABSTRACT:
An imprint apparatus in which a mold having a processing surface on which a predetermined imprint is formed is provided and an uncured resin material placed on a substrate is filled and cured in a space between the mold and the substrate and is subjected to imprint of the predetermined imprint formed on the processing surface of the mold. The imprint apparatus includes an attitude control mechanism for controlling attitudes of the mold and the substrate so that a first gap between a first end of the mold and the substrate and a second gap between a second end of the mold and the substrate are different from each other, and a measuring mechanism for measuring attitudes and positions of the mold and the substrate. Also provided is a mechanism for imparting a relative movement between the substrate and the mold so that the resin material approaches the first end of the mold and enters through the first gap and fills at least a part of the space between the mold and the substrate.

REFERENCES:
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patent: 6696220 (2004-02-01), Bailey et al.
patent: 6873087 (2005-03-01), Choi et al.
patent: 7347683 (2008-03-01), Seki et al.
patent: 7442028 (2008-10-01), Seki
patent: 2007/0026542 (2007-02-01), Sreenivasan et al.
patent: 2008/0128945 (2008-06-01), Seki et al.
patent: 2008/0131550 (2008-06-01), Seki et al.
S. Y. Chou, et al., “Imprint of Sub-25 nm Vias and Trenches in Polymers”, Applied Physics Letters, Nov. 20, 199, pp. 3114-3116, vol. 67, Issue 21.

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