Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-10-30
2007-10-30
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S907000, C430S910000, C430S325000, C430S326000, C430S313000, C430S323000, C526S242000, C526S245000
Reexamination Certificate
active
11063940
ABSTRACT:
A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures:wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
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Allen Robert David
Brock Phillip Joe
Gil Dario
Hinsberg William Dinan
Larson Carl Eric
International Business Machines - Corporation
Lee Sin
Li, Esq. Todd M. C.
Scully , Scott, Murphy & Presser, P.C.
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