Immersion lithography apparatus and method

Details Immersion lithography apparatus and method Immersion lithography apparatus and method

2007-09-11

2007-09-11

Kim, Robert (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492230, C250S492200, C250S492100, C250S491100, C359S738000, C359S740000, C385S008000

Reexamination Certificate

active

11129975

ABSTRACT:
Disclosed is an immersion lithography system comprising a liquid crystal media. The liquid crystal is positioned between an objective lens and a substrate stage. A liquid crystal controller having a first electrode and a second electrode is configured to control the liquid crystal during an exposure process.

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