Imaging systems

Details Imaging systems Imaging systems

2008-05-20

2008-05-20

Schwartz, Jordan M. (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S494010, C359S722000, C359S796000

Reexamination Certificate

active

07375897

ABSTRACT:
In certain aspects, the disclosure relates to an imaging system, particularly an objective or an illumination device of a microlithography projection-exposure apparatus having an optical axis (OA), with at least one optical element of an optically uniaxial crystal material whose optical crystallographic axis is substantially parallel to the optical axis (OA) of the imaging system and which at a working wavelength has an ordinary refractive index noand an extraordinary refractive index ne, with the extraordinary refractive index nebeing smaller than the ordinary refractive index no; wherein the optical element is arranged in the ray path pattern in such a way that, at least for rays of the working wavelength which meet the optical element at an angle that falls within an angular range from the optical axis, the p-polarized component is reflected more strongly than the s-polarized component.

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