Imaging system for deep ultraviolet lithography

Details Imaging system for deep ultraviolet lithography Imaging system for deep ultraviolet lithography

1995-08-14

1997-07-22

Sugarman, Scott J.

Optical: systems and elements

Lens

With reflecting element

359731, G02B 1700

Patent

active

056508778

ABSTRACT:
A catadioptric reduction system operating in the deep ultraviolet range projects a reduced image of a mask on a substrate. A reducing optic made of a material transmissive to deep ultraviolet light has a concave front face covered by a partially reflective surface and a convex back face covered by a concave reflective surface surrounding a central aperture. The partially reflective surface transmits a portion of the light passing through the mask to the concave reflecting surface, which returns a portion of the transmitted light to the partially reflective surface. A portion of the returned light is reflected by the partially reflective surface on a converging path through said central aperture for producing a reduced image of the mask on the substrate.

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"A New Series of Microscope Objectives: I. Catadioptric Newtonian Systems" by David S. Grey and Paul H. Lee, Journal of the Optical Society of America, vol. 39, No. 9, Sep. 1949, pp. 719-728.

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