Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-05-23
2006-05-23
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S005000, C430S270100, C430S302000, C430S306000, C430S330000, C430S910000, C430S964000
Reexamination Certificate
active
07049047
ABSTRACT:
Thermally imageable elements comprising a masking layer and a substrate are disclosed. The masking layer contains a sulfated polymer or a mixture of sulfated polymers and absorbs both infrared and ultraviolet radiation. When the masking layer is on the substrate, the imageable element may be imaged and developed to form a photomask. When the imageable element additionally comprises a photosensitive layer, the masking layer may be imaged and developed to form an integral photomask. The imageable elements that comprise a photosensitive layer are useful as flexographic printing plate precursors.
REFERENCES:
patent: 4323637 (1982-04-01), Chen et al.
patent: 4427759 (1984-01-01), Gruetzmacher et al.
patent: 4894315 (1990-01-01), Feinberg et al.
patent: 5262275 (1993-11-01), Fan
patent: 5705310 (1998-01-01), Van Zoeren
patent: 5719009 (1998-02-01), Fan
patent: 5912105 (1999-06-01), Haberhauer et al.
patent: 6063546 (2000-05-01), Gelbart
patent: 6238837 (2001-05-01), Fan
patent: 6312872 (2001-11-01), Murphy et al.
patent: 6367381 (2002-04-01), Kanga
patent: 6413699 (2002-07-01), Kanga
patent: 6472121 (2002-10-01), Murphy et al.
patent: 6521390 (2003-02-01), Leinbach et al.
patent: 6558876 (2003-05-01), Fan
patent: 6599679 (2003-07-01), Philipp et al.
patent: 6605410 (2003-08-01), Yang et al.
patent: 2001/0053498 (2001-12-01), Fujimoto et al.
patent: 2002/0115019 (2002-08-01), Kaczun et al.
patent: 2002/0197540 (2002-12-01), Goodin et al.
patent: 2003/0129533 (2003-07-01), Goodin et al.
patent: 2005/0008965 (2005-01-01), Tao et al.
patent: 2005/0129915 (2005-06-01), Tao et al.
patent: 2001-260551 (2001-09-01), None
Kice et al, The Mechanism of the Acid Hydrolysis of Sodium Aryl Sulfates, Journal of the American Chemical Society, vol. 88, Nov. 20, 1966, pp. 5242-5245.
Burstein et al, Kinetics and Mechanism of Solvolysis of Steroid Hydrogen Sulfates, Journal of the American Chemical Society, vol. 80, Oct. 5, 1958, pp. 5235-5239.
McCullough Chris
Ray Kevin Barry
Tenaglia Davide
Eastman Kodak Company
Schilling Richard L.
Tucker J. Lanny
LandOfFree
Imageable element with masking layer comprising sulfated... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Imageable element with masking layer comprising sulfated..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Imageable element with masking layer comprising sulfated... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3612604