Imageable bottom anti-reflective coating for high resolution...

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

Reexamination Certificate

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C257S464000

Reexamination Certificate

active

10150197

ABSTRACT:
A semiconductor wafer may be coated with an imageable anti-reflective coating. As a result, the coating may be removed using the same techniques used to remove overlying photoresists. This may overcome the difficulty of etching anti-reflective coatings using standard etches because of their poor selectivity to photoresist and the resulting propensity to cause integrated circuit defects arising from anti-reflective coating remnants.

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Derwent-Acc-No. 2003-026401, Derwent-Week 200302, Copyright 1999 Derwent Information Ltd.

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