Image sensor with optical guard ring and fabrication method...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – In combination with or also constituting light responsive...

Reexamination Certificate

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C257S079000, C257S082000, C257S113000, C257S114000, C257S118000, C257S431000, C257S432000, C257S435000, C257S444000, C257S446000, C257S466000, C257SE31101, C257SE31102, C257SE31103, C257SE31108

Reexamination Certificate

active

07122840

ABSTRACT:
An image sensor device and fabrication method thereof wherein a substrate having at least one shallow trench isolation structure therein is provided. At least one photosensor and at least one light emitting element, e.g., such as MOS or LED, are formed in the substrate. The photosensor and the light emitting element are isolated by the shallow trench isolation structure. An opening is formed in the shallow trench isolation structure to expose part of the substrate. An opaque shield is formed in the opening to prevent photons from the light emitting element from striking the photosensor.

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