Image sensor having self-aligned and overlapped photodiode...

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

Reexamination Certificate

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Details

C257S233000, C257S292000, C257SE31084, C257SE27133, C438S060000, C438S075000

Reexamination Certificate

active

11044422

ABSTRACT:
An image sensing device includes a gate dielectric layer formed on a substrate and a transfer gate formed on the gate dielectric layer. A masking layer is formed on the transfer gate, the masking layer having a width smaller than a width of the transfer gate, such that a portion of the transfer gate protrudes laterally from under the masking layer. A photodiode is formed in the substrate to be self-aligned with the masking layer and to extending laterally under the transfer gate, that is, to overlap the transfer gate. Because of the overlap of the photodiode with the transfer gate, offset between the photodiode and the transfer gate is eliminated, such that an image lag phenomenon is eliminated.

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patent: 6504193 (2003-01-01), Ishiwata et al.
patent: 6642076 (2003-11-01), Yaung et al.
patent: 2003/0173585 (2003-09-01), Kimura et al.
patent: 2002-231915 (2002-08-01), None
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patent: 2003-37870 (2003-05-01), None
patent: 03-58291 (2003-07-01), None
patent: 2003-58291 (2003-07-01), None

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