Image sensor and method for manufacturing the same

Details Image sensor and method for manufacturing the same Image sensor and method for manufacturing the same

2008-03-11

2010-11-09

Arora, Ajay K (Department: 2892)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C257SE31001, C257S432000, C257S435000, C438S048000, C438S065000

Reexamination Certificate

active

07829371

ABSTRACT:
An image sensor including an interlayer dielectric layer formed over a semiconductor substrate, a color filter layer formed over the interlayer dielectric layer, a planarization layer formed over the color filter, and a microlens array having a gapless, continuous shape and a multilayered structure formed over the planarization layer.

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patent: 10-2007-0023027 (2007-02-01), None

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