Etching a substrate: processes – Forming or treating electrical conductor article
Reexamination Certificate
2006-04-19
2009-10-27
Norton, Nadine (Department: 1792)
Etching a substrate: processes
Forming or treating electrical conductor article
C438S134000, C438S181000, C257S022000, C257S233000, C257S292000
Reexamination Certificate
active
07608192
ABSTRACT:
An image sensor and a method for fabricating the same are provided. The image sensor includes a first conductive type substrate including a trench formed in a predetermined portion of the first conductive type substrate, a second conductive type impurity region for use in a photodiode, formed below a bottom surface of the trench in the first conductive type substrate, and a first conductive type epitaxial layer for use in the photodiode, buried in the trench.
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H. Schafer, Applied Surface Science, vol. 224, (2004), pp. 18-23.
Cha Han Seob
Kim Hee Jeen
Angadi Maki
McAndrews Held & Malloy Ltd.
Norton Nadine
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