Image sensor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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Details

257239, 257386, 257462, 257463, H01L 31062, H01L 31113, H01L 3106

Patent

active

059775769

ABSTRACT:
In an image sensor 1 wherein an N.sup.+ -type impurity layer 13 to become a light-receiving part of a first conductive type is formed in a well layer 12 of a second conductive type (P-type) provided in a semiconductor substrate 11 of the first conductive type (N-type), an N.sup.- -type impurity layer 14 whose impurity concentration is lower than that of the N.sup.+ -type impurity layer 13 and connected to the lower side of the N.sup.+ -type impurity layer 13 is provided between the N.sup.+ -type impurity layer 13 and the P-type well layer 12. Alternatively, a P-type impurity layer (not shown) whose impurity concentration is lower than that of the P-type well layer 12 and joining with the lower side of the N.sup.+ -type impurity layer 13 may be provided.

REFERENCES:
patent: 5008723 (1991-04-01), van der Have

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