Image reversal technique for forming small structures in integra

Details Image reversal technique for forming small structures in integra Image reversal technique for forming small structures in integra

1996-04-22

1998-11-10

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430313, 430314, 430316, G03F 700

Patent

active

058341595

ABSTRACT:
The present invention provides a method for fabricating small structures to be employed in integrated circuits formed on a semiconductor substrate. Examples of such small structures include contacts, vias, and metal lines. The method of the present invention employs an image reversal technique to obtain improved feature definition. In forming a feature in a layer of material, a clear field reticle is used to form patterned segments of photoresist each having a size, a shape, and a location substantially identical to the size, the shape, and the location of one of the features intended to be formed in the layer of material. This method is employed instead of using a dark field reticle which forms windows in a photoresist each having a size, a shape, and a location substantially identical to the size, the shape, and the location of one of the features intended to be formed in the layer of material. For small structures, the openings or windows in a photoresist are harder to form than the patterned segments of photoresist. With the method of the present invention which employs a clear field reticle to form a mask comprising patterned segments of photoresist, the limitations of patterning small windows in a photoresist with the use of a dark field reticle are avoided. The accuracy of forming the small structures is thus improved.

REFERENCES:
patent: 5238810 (1993-08-01), Lowrey et al.
patent: 5270236 (1993-12-01), Rosner
patent: 5283208 (1994-02-01), Lorsung et al.

Affiliated with

Also associated with

Rating

Image reversal technique for forming small structures in integra does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Image reversal technique for forming small structures in integra, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image reversal technique for forming small structures in integra will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1515046