Image-forming process

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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430311, 430319, 427 96, G03F 700

Patent

active

055567355

ABSTRACT:
A process for the formation of a patterned resist of a photocurable material on a circuit board, the uncured portion of which is water soluble. The process includes the steps of forming a layer of an aqueous emulsion of a photocurable material upon the circuit board, drying the layer to a substantially dry and non-tacky state, imagewise exposing the layer to radiation to cure (harden) portions of the layer exposed to the radiation, and removing unexposed (uncured) portions of the layer by washing with water. In a preferred embodiment, the photocurable material is an organic solvent solution of an epoxy acrylate derived from an epoxy novolac resin which has been carboxylated to render it alkali-developable.

REFERENCES:
patent: 4154614 (1979-05-01), Tsunoda
patent: 4592816 (1986-06-01), Emmons
patent: 5093223 (1992-03-01), Iwasawa

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