Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-10-06
1999-08-03
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430905, 430920, G03F 7004
Patent
active
059323922
ABSTRACT:
Disclosed are an image forming material comprising a support and provided thereon, a light sensitive layer containing a compound capable of generating an acid on exposure of infrared rays, a resol resin, an acryl resin containing a monomer unit with a phenolic hydroxy group, and an infrared absorber and an image forming method employing the image forming material.
REFERENCES:
patent: 2243621 (1941-05-01), Denoix
patent: 2610842 (1952-09-01), Schoenmakers et al.
patent: 3515552 (1970-06-01), Smith
patent: 3536489 (1970-10-01), Smith
patent: 3779779 (1973-12-01), Landsman
patent: 3779998 (1973-12-01), Hermann
patent: 5340699 (1994-08-01), Haley
patent: 5372915 (1994-12-01), Haley et al.
patent: 5658708 (1997-08-01), Kondo
patent: 5731127 (1998-03-01), Ishizuka et al.
Hirai Katsura
Kizu Noriyuki
Chu John S.
Clarke Yvette M.
Konica Corporation
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