Image forming composition and photosensitive lithographic...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S302000, C430S910000, C528S010000, C556S438000

Reexamination Certificate

active

07112397

ABSTRACT:
The present invention provides image-forming compositions and photosensitive lithographic plates which are excellent in sensitivity to infrared radiation, latitude of development, treatable area in m2, and printing durability. Specifically, the present invention provides an image-forming composition comprising (A) a polymeric compound obtainable by the addition reaction of a resinous polymer having one or more phenolic hydroxyl groups with a silane coupling agent of the following general formula (1) or (2), (B) an acid generator, (C) an infrared absorber, and (D) an alkali-soluble resin, and a photosensitive lithographic plate having this image-forming composition applied onto a substrate.wherein X1and X2each represent a trimethoxysilyl group or the like; G1represents O or COO; R1and R2each independently represents a hydrogen atom or a methoxy group; R3represents (CH2)mwhich may have a hydrocarbon side chain; G2represents O or COO; R4represents a hydrogen atom or a straight-chain or branched alkyl group; and R5represents (CH2)nwhich may have a hydrocarbon side chain.

REFERENCES:
patent: 5262273 (1993-11-01), Agostino et al.
patent: 2004/0175655 (2004-09-01), Toyoda et al.
patent: 0 285 025 (1988-03-01), None
patent: 0 146 411 (1991-07-01), None
patent: 0 625 728 (1994-11-01), None
patent: 0 672 954 (1995-09-01), None
patent: 0 823 327 (1998-02-01), None
patent: 55-057841 (1980-04-01), None
patent: 55-127553 (1980-10-01), None
patent: 60-037549 (1985-02-01), None
patent: 60-198538 (1985-10-01), None
patent: 07-285275 (1995-10-01), None
patent: 10-268512 (1998-10-01), None
patent: 10-282654 (1998-10-01), None
patent: 2002-80481 (2002-03-01), None
patent: 2002-080481 (2002-03-01), None
patent: 2003-292496 (2003-10-01), None
patent: WO 97/39894 (1997-10-01), None
CAplus abstract DN 139:292355 of JP 2003-292496, Oct. 2003.
CAplus abstract DN 136:247695 of JP 2002-080481, Mar. 2002.
CAplus abstract DN 132:293809 for Yamaguchi et al., Chem.Letters, 2000, 3, 228.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Image forming composition and photosensitive lithographic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Image forming composition and photosensitive lithographic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image forming composition and photosensitive lithographic... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3562671

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.